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First name
Douglas
Middle name
A.
Last name
Keszler

McGlone JM, Olsen KR, Stickle W, Abbott JE, Pugliese RA, Long GS, et al. Ta-based amorphous metal thin films. Journal of Alloys and Compounds [Internet]. 2015;650(25 November 2015). Available from: http://www.sciencedirect.com/science/article/pii/S0925838815306253
Smith SW, Wang W, Keszler DA, Conley JF. Solution based prompt inorganic condensation and atomic layer deposition of Al203 films: A side-by-side comparison. Journal of Vacuum Science & Technology [Internet]. 2014;A 32(4). Available from: http://hdl.handle.net/1957/51279
Perkins CK, Mansergh RH, Park DH, Nanayakkara CE, Ramos JC, Decker SR, et al. Aqueous process to limit hydration of thin-film inorganic oxides [Internet]. 2016. Available from: https://utdallas.influuent.utsystem.edu/en/publications/aqueous-process-to-limit-hydration-of-thin-film-inorganic-oxides